发明名称 SEMICONDUCTOR STACK STRUCTURE AND FABRICATION METHOD THEREOF
摘要 A fabrication method of a semiconductor stack structure mainly includes: singulating a wafer of a first specification into a plurality of chips; rearranging the chips into a second specification of a wafer so as to stack the chips on a substrate of the second specification through a plurality of blocks; forming a redistribution layer on the chips; and performing a cutting process to obtain a plurality of semiconductor stack structures. Therefore, the present invention allows a wafer of a new specification to be processed by using conventional equipment without the need of new factory buildings or equipment. As such, chip packages can be timely supplied to meet the replacement speed of electronic products.
申请公布号 US2013168868(A1) 申请公布日期 2013.07.04
申请号 US201213727976 申请日期 2012.12.27
申请人 XINTEC INC.;XINTEC INC. 发明人 HO YEH-SHIH;KUAN HSIN;YEOU LONG-SHENG;LIU TSANG-YU;CHENG CHIA-MING
分类号 H01L21/82;H01L23/14 主分类号 H01L21/82
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