Described herein are aqueous acidic glass etching solutions or media comprising HF and H2SO4, wherein HF is present in concentrations not exceeding about 1.3M. The etching solutions are used to treat glass articles such as thin glass sheets at above-ambient temperatures to etch slight thicknesses of surface glass therefrom, the etching solutions exhibiting improved stability against dissolved glass precipitation and rapid glass removal rates at slightly elevated temperatures.
申请公布号
WO2013101444(A1)
申请公布日期
2013.07.04
申请号
WO2012US68735
申请日期
2012.12.10
申请人
CORNING INCORPORATED;GU, YUNFENG;HOU, JUN;ORCUTT, TIMOTHY JAMES;STERNQUIST, DANIEL ARTHUR;STONE, JEFFERY SCOTT
发明人
GU, YUNFENG;HOU, JUN;ORCUTT, TIMOTHY JAMES;STERNQUIST, DANIEL ARTHUR;STONE, JEFFERY SCOTT