| 摘要 |
PURPOSE: A wide area-protection exposure apparatus is provided to improve intensity, uniformity and resolution and to obtain an accurate pattern. CONSTITUTION: A wide area-protection exposure apparatus comprises a light source part (110), a reflector part(120), a first mirror part(130), an integrator lens(140), a beam shutter(150), a second mirror part(160), a third mirror part(170), and a lens module(180). A reflector part collects beam from the light source part. The first mirror part reflects the beam. The integrator lens integrates reflected beam from the first mirror part. The beam shutter shields the integrated beam in a moment. The second mirror part changes path the integrated beam which is passed through the beam shutter. The third mirror part concentrates and reflects the beam on a mask(10) in a wide area. The projections lens module projects the beam onto a substrate(20). |
