发明名称 METHOD FOR FABRICATING GaN FILM AND SUBSTRATE FOR FABRICATING GaN FILM
摘要 PURPOSE: A method for manufacturing gallium nitride and a gallium nitride film board are provided to prevent cracks on a nitride film due to changed material property. CONSTITUTION: A method for manufacturing gallium nitride comprises the following steps. From the inside of a board, a gallium nitride(GaN) atom and an atom of the board are mixed to form a mixture layer(S110). Gallium nitride is grown on the board(S120). [Reference numerals] (S110) Forming a mixed layer in a substrate; (S120) Growing gallium nitride on the substrate;
申请公布号 KR101279398(B1) 申请公布日期 2013.07.04
申请号 KR20110105311 申请日期 2011.10.14
申请人 发明人
分类号 C01B21/06;C23C16/34 主分类号 C01B21/06
代理机构 代理人
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