发明名称 |
PHOTOSENSITIVE PRINT PLATE DEVELOPING METHOD AND DEVELOPING DEVICE |
摘要 |
<p>Provided are a developing method and a developing device with which, even if a CTP photosensitive print plate is developed in quantity, impurities from non-exposed parts are not prone to stick to or accumulate on a brush. This photosensitive print plate developing method includes a step of supplying an aqueous developer fluid to an exposed photosensitive print plate which is formed from at least a support body, a photosensitive resin, and a thermosensitive mask layer stacked in this order, and removing non-exposed parts with a brush. The method further comprises a step of, prior to the preceding step, causing flowing water to travel over the entire surface of the thermosensitive mask layer of the photosensitive print plate and removing the thermosensitive mask layer in a film state.</p> |
申请公布号 |
WO2013099797(A1) |
申请公布日期 |
2013.07.04 |
申请号 |
WO2012JP83241 |
申请日期 |
2012.12.21 |
申请人 |
TOYOBO CO., LTD.;MOTOI, KEIICHI;KONO, MICHIATSU |
发明人 |
MOTOI, KEIICHI;KONO, MICHIATSU |
分类号 |
G03F7/38;G03F7/00;G03F7/095;G03F7/30 |
主分类号 |
G03F7/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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