| 摘要 |
PROBLEM TO BE SOLVED: To provide an inactive gas injection apparatus which prevents a substrate from deteriorating from the proper state and also prevents particles from adhering to the substrate when an inactive gas is injected into a container.SOLUTION: In an inactive gas injection apparatus, injection means N, which injects an inactive gas from an air inlet 50i of a container 50 into the container 50 while discharging a gas in the container 50 from an air outlet 50o of the container 50 to the exterior, is installed on a support part supporting the container 50 housing a substrate W, and the inactive gas injection apparatus is provided with control means H controlling the operation of the injection means N. The injection means N is formed so that the supply flow rate of the inactive gas may change. The control means H is formed so as to control the operation of the injection means N so that the supply flow rate is gradually increased toward a target flow rate when the inactive gas is supplied to the container 50 supported by the support part. |
