PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PRODUCING SEMICONDUCTOR ELEMENT

摘要

A photosensitive resin composition which exhibits positive or negative photosensitibility and which is to be used in an ion implantation step as the mask, containing a polysiloxane (A) as the resin. This photosensitive resin composition has high heat resistance, enables the control of pattern shape, and exhibits excellent mask performance against ion implantation, thus being applicable to a less costly high-temperature ion implantation process.