COMPOUND OXIDE SINTERED COMPACT, TARGET, OXIDE TRANSPARENT CONDUCTIVE FILM AND PRODUCTION METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a compound oxide sintered compact giving an oxide transparent conductive film exhibiting lower light-absorbing properties over wide wavelength region, having high mechanical strength, further suppressing anomalous discharge during sputtering; and an oxide transparent conductive film obtained by using the same.SOLUTION: The oxide transparent conductive film is obtained by sputtering using a sputtering target comprising a compound oxide sintered compact including zirconium-containing particles with average particle diameter of 2 μm or less, where indium (In) and zirconium (Zr) satisfy atomic ratio Zr/(In+Zr) of 0.05-5 at%.