PATTERN FORMATION METHOD, MOLD RECOVERY METHOD, AND METHOD FOR MANUFACTURING REPLICA MOLD

摘要

PROBLEM TO BE SOLVED: To provide a technique for removing a resin and the like adhering to a mold in nanoimprint lithography.SOLUTION: A pattern formation method comprises the steps of: forming a pattern on a resin 12 using a nanoimprint mold 14; and removing the resin 12 when a resin 22 adheres to the nanoimprint mold 14 used to form the pattern by irradiating the nanoimprint mold 14 with atomic hydrogen. The mold 14 from which the adhering resin 22 was removed can be used to form a pattern again.