| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device which prevents a water mark from being formed on a surface of the substrate.SOLUTION: A substrate cleaning device of this invention includes: a substrate holding mechanism 1 horizontally holding a substrate W; a rotation mechanism 2 rotating the substrate W held by the substrate holding mechanism 1; a liquid supply nozzle 4 supplying a cleaning fluid to the substrate W; a rotation cover 3 disposed around the substrate W and rotating at substantially the same speed as the substrate W; and a liquid discharge passage 30 and an air discharge passage 31 which are provided below discharge holes 25 formed at a stage 11B and are annularly formed. The rotation cover 3 has an inner peripheral surface enclosing the substrate W, and the inner peripheral surface inclines to the radially inner side from a lower end to an upper end thereof. |
