| 摘要 |
<p>This method involves a step (S60) in which, while supplying to the surface of a glass substrate a polishing liquid containing, as abrasive grains, any of cerium oxide, zirconium oxide and zirconium silicate, the surface of the glass substrate is roughly polished by sliding contact with a polishing pad, a step (S65) in which, after the glass substrate has been removed from the polishing pad, the surface of the glass substrate is acid-washed while supplying an acidic cleaning liquid to the surface of the glass substrate, and a step (S70) for forming a compressive stress layer on the surface of the glass substrate after acid washing. When the glass substrate is removed from the polishing pad, said removal is performed with the glass substrate in a state in contact with the liquid having a 0.5-10w% abrasive grain concentration.</p> |
