发明名称 |
Photosensitive Novolac Resin, Positive Photosensitive Resin Composition Including Same, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film |
摘要 |
Disclosed is a photosensitive novolac resin including a structural unit represented by the following Chemical Formula 1 and structural unit represented by the following Chemical Formula 2, wherein R11, R12, R13, and R14 in Chemical Formulae 1 and 2 are the same as defined in the detailed description, a positive photosensitive resin composition including the same, a photosensitive resin film fabricated using the same, and a semiconductor device including the photosensitive resin composition.
|
申请公布号 |
US2013171563(A1) |
申请公布日期 |
2013.07.04 |
申请号 |
US201213590440 |
申请日期 |
2012.08.21 |
申请人 |
LEE JONG-HWA;CHO HYUN-YONG;CHUNG MIN-KOOK;JEONG JI-YOUNG;CHA MYOUNG-HWAN;CHEIL INDUSTRIES INC. |
发明人 |
LEE JONG-HWA;CHO HYUN-YONG;CHUNG MIN-KOOK;JEONG JI-YOUNG;CHA MYOUNG-HWAN |
分类号 |
C08G8/28;G03F7/023;G03F7/075 |
主分类号 |
C08G8/28 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|