OPTICAL DEVICE, OPTICAL THIN FILM FORMATION DEVICE, AND OPTICAL THIN FILM FORMATION METHOD

摘要

Prior to formation of an optical thin film (14) on a curved surface (3a) of a material (3) on which the film is to be formed, a predetermined space (8), which is a portion of the space inside a processing chamber (2) and is located between a holder section (4) and a target (5), is surrounded with a shielding section (9). When film formation is performed in said condition through a sputtering process, during which a voltage is applied to the target (5) inside the processing chamber (2) that is in a vacuum state with an active gas and an inert gas supplied thereto, an optical thin film having a substantially uniform optical film thickness is formed on the curved surface.