| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a sapphire substrate having a surface roughness which is almost the same as the surface roughness on a surface of the sapphire substrate obtained by CMP polishing even when a process expense is reduced, and a sapphire substrate.SOLUTION: A method for manufacturing a sapphire substrate by applying processing covering a plurality of steps to a substrate 10 obtained by slicing a sapphire ingot includes a step of etching at least a principal surface 10A of the substrate 10 by reactive ion etching. |
