发明名称 BONDED STRUCTURE EMPLOYING METAL SEMICONDUCTOR ALLOY BONDING
摘要 Vertical stacks of a metal portion and a semiconductor portion formed on a first substrate are brought into physical contact with vertical stacks of a metal portion and a semiconductor portion formed on a second substrate. Alternately, vertical stacks of a metal portion and a semiconductor portion formed on a first substrate are brought into physical contact with metal portions formed on a second substrate. The assembly of the first and second substrates is subjected to an anneal at a temperature that induces formation of a metal semiconductor alloy derived from the semiconductor portions and the metal portions. The first substrate and the second substrate are bonded through metal semiconductor alloy portions that adhere to the first and second substrates.
申请公布号 US2013171773(A1) 申请公布日期 2013.07.04
申请号 US201313780810 申请日期 2013.02.28
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FAROOQ MUKTA G.;LI ZHENGWEN;LUO ZHIJIONG;ZHU HUILONG
分类号 H01L21/768 主分类号 H01L21/768
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