| 摘要 |
The invention provides an insulation member and a substrate processing apparatus having the same. The insulation member can prevent a sealing component from degradation because of plasma. The insulation member (14) that isolates the pedestal (12) and a bottom face (51) of a chamber in the chamber (11) of the substrate processing device (10) is provided with an inner member (41), an outer member (42), and an O-shaped sealing ring (43) disposed between the inner member and the outer member. The outer member is composed of a combined assembly having long strip shaped objects (44-47) corresponding to edges of the rectangular pedestal. End faces of the long strip shaped objects abut against end faces of the other long strip shaped objects. An end of the combined assembly is fixed on the bottom face of the chamber through a threaded hole (48) used for fixing while the other end is supported freely through a threaded hole (49) used for supporting. |
