发明名称 |
METHOD FOR DEPOSITING A LAYER ON THE SURFACE OF A SUBSTRATE |
摘要 |
A process for depositing a layer on at least part of the surface of a substrate by at least partially submerging the substrate in a solution comprising a solvent and at least one compound intended to form the layer, then drying the substrate, this drying being at least partially carried out in an atmosphere that is isolated from the solution. The submersion in the solution and the drying of the substrate are carried out in the same controlled-atmosphere enclosure.
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申请公布号 |
US2013171356(A1) |
申请公布日期 |
2013.07.04 |
申请号 |
US201113810054 |
申请日期 |
2011.07.12 |
申请人 |
GROSSO DAVID;BOISSIERE CEDRIC;SANCHEZ CLEMENT;ALBOUY PIERRE ANTOINE;UNIVERSITE PIERRE ET MARIE CURIE (PARIS 6);UNIVERSITE PARIS-SUD 11;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE |
发明人 |
GROSSO DAVID;BOISSIERE CEDRIC;SANCHEZ CLEMENT;ALBOUY PIERRE ANTOINE |
分类号 |
B05D1/18 |
主分类号 |
B05D1/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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