发明名称 |
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE |
摘要 |
<p>There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin capable of increasing the polarity by the action of an acid to decrease the solubility for an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin substantially free from a fluorine atom and a silicon atom and different from the resin (A), (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.</p> |
申请公布号 |
WO2013100189(A1) |
申请公布日期 |
2013.07.04 |
申请号 |
WO2012JP84294 |
申请日期 |
2012.12.27 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
ITO, JUNICHI;TAKAHASHI, HIDENORI;YAMAGUCHI, SHUHEI;YAMAMOTO, KEI |
分类号 |
G03F7/004;G03F7/038;G03F7/32 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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