发明名称 ULTRASONIC CLEANING METHOD
摘要 PURPOSE: An ultrasonic cleaning method is provided to easily clean an object in a solution by irradiating ultrasonic waves to the solution with a dissolved gas. CONSTITUTION: The dissolved gas concentration of a solution is controlled to a first dissolved gas concentration (S11). The irradiation of ultrasonic waves to the solution with the first dissolved gas concentration is started (S12). The dissolved gas concentration of the solution is controlled to a second dissolved gas concentration (S13). The irradiation of the ultrasonic waves is stopped (S14). [Reference numerals] (S11) Dissolved gas concentration is controlled to a first dissolved gas concentration; (S12) Irradiation of ultrasonic waves is started; (S13) Dissolved gas concentration of the solution is controlled to a second dissolved gas concentration; (S14) Irradiation of the ultrasonic waves is stopped
申请公布号 KR20130074754(A) 申请公布日期 2013.07.04
申请号 KR20120151296 申请日期 2012.12.21
申请人 SILTRONIC AG 发明人 HAIBARA TERUO;KUBO ETSUKO;MORI YOSHIHIRO;UCHIBE MASASHI
分类号 H01L21/302 主分类号 H01L21/302
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