发明名称
摘要 The present invention provides a display device which forms a drive circuit using a bottom-gate-type TFT made of poly-Si which generates a small leak current in a periphery of a display region. A gate electrode is made of Mo having a high melting point, and a gate insulation film is formed on the gate electrode. A channel layer constituted of a poly-Si layer is formed on the gate insulation film, and the poly-Si layer is covered with an a-Si layer. An n+Si layer is formed on the a-Si layer, and an SD electrode is formed on the n+Si layer. Although holes are induced in the poly-Si layer when a negative voltage (inverse bias) is applied to the gate electrode, the holes cannot pass through the a-Si layer and hence, no drain current flows. Accordingly, it is possible to realize a bottom-gate-type TFT using poly-silicon which generates a small leak current.
申请公布号 JP5226259(B2) 申请公布日期 2013.07.03
申请号 JP20070215006 申请日期 2007.08.21
申请人 发明人
分类号 H01L29/786;G02F1/1368;H01L21/20;H01L21/268;H01L21/28;H01L21/336;H01L29/417;H01L29/423;H01L29/49 主分类号 H01L29/786
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