发明名称 SEPARATION CONTROL SUBSTRATE/TEMPLATE FOR NANOIMPRINT LITHOGRAPHY
摘要 <p>Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.</p>
申请公布号 KR20130073890(A) 申请公布日期 2013.07.03
申请号 KR20127029597 申请日期 2011.04.27
申请人 MOLECULAR IMPRINTS, INC. 发明人 IM SE HYUK;GANAPATHISUBRAMANIAN MAHADEVAN;FLETCHER EDWARD B.;KHUSNATDINOV NIYAZ;SCHMID GERARD M.;MEISSL MARIO JOHANNES;CHERALA ANSHUMAN;XU FRANK Y.;CHOI BYUNG JIN;SREENIVASAN SIDLGATA V.
分类号 H01L21/027;G03F7/00 主分类号 H01L21/027
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