发明名称
摘要 A laser exposure method for performing exposure is provided in which a supporting stage (2) supporting a plurality of objects (workpieces 5) and a laser beam illumination device (3) illuminating the objects while a focus servo control based on reflected light is being effected are moved relative to each other. The method includes a control start step of starting the focus servo control when the laser beam has reached a focus start position (FS) on an object; a control stop step of stopping the focus servo control when the laser beam has reached a focus stop position (FE) on the object; and a retaining step of retaining a position of an optical component (objective lens 35) at a predetermined position for a period until the laser beam starting from the focus stop position (FE) on the object reaches a focus start position (FS) on a subsequent object.
申请公布号 JP5226557(B2) 申请公布日期 2013.07.03
申请号 JP20090032581 申请日期 2009.02.16
申请人 发明人
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址