| 摘要 |
PURPOSE: A mask assembly, a substrate processing device, and a substrate processing system thereof are provided to prevent deformation due to the pressure and heat by employing mechanically strong structures and materials to a frame unit and making a mask unit with ion beam-resistant materials; preventing errors in processing substrates; and reducing the production costs. CONSTITUTION: A mask assembly (300) is installed between an ion beam irradiation unit and a transport path, and part of the ion beam is placed on the surface of a substrate. A frame unit (310) has more than one opening unit (311) to and from which the mask assembly attaches and detaches. The mask assembly includes a mask unit (320) with more than one pattern hole (321) which is for irradiating part of an ion beam on the surface of a substrate. |
