发明名称 |
MOLYBDENUM (IV) AMIDE PRECURSORS AND USE THEREOF IN ATOMIC LAYER DEPOSITION |
摘要 |
<p>Molybdenum (IV) amide complexes are disclosed herein corresponding in structure to Formula (I): wherein: L is -NR1R2; R1 and R2 are C1-C6-alkyl or hydrogen; R is C1-C6-alkyl; and n is zero, 1, 2 or 3. Further, methods of forming MoO2 films by atomic layer deposition (ALD) using Formula (I) complexes and Mo[N(Me)(Et)]4 are disclosed herein.</p> |
申请公布号 |
EP2609102(A1) |
申请公布日期 |
2013.07.03 |
申请号 |
EP20110752057 |
申请日期 |
2011.08.25 |
申请人 |
SIGMA-ALDRICH CO. LLC |
发明人 |
HEYS, PETER, NICHOLAS;ODEDRA, RAJESH;HINDLEY, SARAH, LOUISE |
分类号 |
C07F11/00;B05D1/00;C07F17/00;C23C16/40;C23C16/455 |
主分类号 |
C07F11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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