| 摘要 |
There is provided a hard film excellent in wear resistance. The hard film in accordance with the present invention includes (TiaCrbAlcLd)(BxCyNz) in terms of composition, in which the L is at least one of Si and Y, and the a, b, c, d, x, y, and z each denote the atomic ratio, and satisfy: 0.1@a<0.3; 0.3<b<0.6; 0.2@c<0.35; 0.01@d<0.1; a+b+c+d=1; x@0.1; y@0.1; 0.8@z@1; and x+y+z=1.
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