| 摘要 |
The drawing apparatus includes an optical system housing configured to emit a charged particle beam toward the substrate, a stage configured to hold the substrate and be moved at least in a direction perpendicular to an axis of the optical system housing, a detection device including a detector and a support for supporting the detector such that the detector faces a side surface of the stage, and configured for measuring a position of the stage, and a magnetic shield member provided to the stage and configured to shield an opening of the optical system housing that faces a top surface of the stage from a magnetic field. Here, the magnetic shield member is provided to the stage at a region, in a direction of the axis, other than a region where the detection device is provided.
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