发明名称 |
Method and apparatus for monitoring mask process impact on lithography performance |
摘要 |
The present disclosure is directed generally to a method and apparatus for monitoring mask process impact on lithography performance. A method including receiving a physical wafer pattern according to a mask, extracting a mask contour from the mask, and extracting a deconvolution pattern based on the mask contour. A lithography process is simulated to create a virtual wafer pattern based on the deconvolution pattern. The virtual wafer pattern is then compared to the physical wafer pattern.
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申请公布号 |
US8477299(B2) |
申请公布日期 |
2013.07.02 |
申请号 |
US20100752488 |
申请日期 |
2010.04.01 |
申请人 |
WU PING CHIEH;CHEN CHIEN-HSUN;LIU RU-GUN;HUANG WEN-CHUN;LAI CHIH-MING;LUO BOREN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
WU PING CHIEH;CHEN CHIEN-HSUN;LIU RU-GUN;HUANG WEN-CHUN;LAI CHIH-MING;LUO BOREN |
分类号 |
G01B11/26;G01C1/00;G01C1/10 |
主分类号 |
G01B11/26 |
代理机构 |
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地址 |
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