发明名称 |
Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method for controlling saturable absorber used in extreme ultraviolet light source device |
摘要 |
An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
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申请公布号 |
US8476609(B2) |
申请公布日期 |
2013.07.02 |
申请号 |
US201113306358 |
申请日期 |
2011.11.29 |
申请人 |
ENDO AKIRA;NOWAK KRZYSZTOF;HOSHINO HIDEO;ARIGA TATSUYA;MORIYA MASATO;WAKABAYASHI OSAMU;GIGAPHOTON INC. |
发明人 |
ENDO AKIRA;NOWAK KRZYSZTOF;HOSHINO HIDEO;ARIGA TATSUYA;MORIYA MASATO;WAKABAYASHI OSAMU |
分类号 |
G02B26/02 |
主分类号 |
G02B26/02 |
代理机构 |
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代理人 |
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主权项 |
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