发明名称 Circuit structure with vertical double gate
摘要 A circuit structure including a semiconductor substrate having a depression; a first insulating layer positioned on the surface of the depression; a bottom conductor positioned in a bottom portion of the depression, wherein the bottom conductor is connected to an external bias through a plurality of longer vertical contact plugs; an upper conductor positioned in an upper portion of the depression, wherein the upper conductor is connected to a plurality of shorter vertical contact plugs, and a top surface of the upper conductor is higher than a depression-bearing surface of the semiconductor substrate; and a second insulating layer positioned between the bottom conductor and the upper conductor.
申请公布号 US8476704(B2) 申请公布日期 2013.07.02
申请号 US201113213786 申请日期 2011.08.19
申请人 JANG JENG HSING;CHEN YI NAN;LIU HSIEN WEN;NAN YA TECHNOLOGY CORPORATION 发明人 JANG JENG HSING;CHEN YI NAN;LIU HSIEN WEN
分类号 H01L29/78 主分类号 H01L29/78
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