发明名称 Resin composition, gate insulating layer, and organic thin film transistor
摘要 The subject of the present invention is to provide an organic thin film transistor with a small hysteresis. The means for solving the subject is a resin composition for an organic thin film transistor gate insulating layer comprising (A) a macromolecule that comprises at least one repeating unit selected from the group consisting of repeating units represented by Formula (1), repeating units represented by Formula (1'), and repeating units represented by Formula (2) and contains two or more first functional groups in its molecule, wherein the first functional group is a functional group that generates, by the action of electromagnetic waves or heat, a second functional group that reacts with active hydrogen, and (B) at least one compound selected from the group consisting of low-molecular compounds containing two or more active hydrogens in each molecule and macromolecules containing two or more active hydrogens in each molecule.
申请公布号 US8476621(B2) 申请公布日期 2013.07.02
申请号 US200913060456 申请日期 2009.08.25
申请人 YAHAGI ISAO;SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 YAHAGI ISAO
分类号 H01L35/24 主分类号 H01L35/24
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