发明名称 Three-dimensional semiconductor device structures and methods
摘要 A three-dimensional semiconductor device includes a first semiconductor device, a second semiconductor device, and a patterned conductive layer disposed between the first and the second semiconductor devices. The first semiconductor device has a first plurality of terminals on a front side of the first semiconductor device and a first metal substrate on its back side, wherein one of the first plurality of terminals in the first semiconductor device is electrically coupled to the first metal substrate. The second semiconductor device has a second plurality of terminals on a front side of the second semiconductor device and a second metal substrate on its back side, wherein the second semiconductor device further includes a second metal substrate on its back side. The patterned conductive layer includes a plurality of conductive regions. Each of the conductive regions is bonded to a conductor coupled to one of the first plurality of terminals and another conductor coupled to one of the second plurality of terminals.
申请公布号 US8476703(B2) 申请公布日期 2013.07.02
申请号 US201113212175 申请日期 2011.08.18
申请人 WANG QI;FAIRCHILD SEMICONDUCTOR CORPORATION 发明人 WANG QI
分类号 H01L29/66 主分类号 H01L29/66
代理机构 代理人
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