发明名称 Method of determining FET source/drain wire, contact, and diffusion resistances in the presence of multiple contacts
摘要 A method calculates a total source/drain resistance for a field effect transistor (FET) device. The method counts the number (N) of contacts in each source/drain region of the FET device, partitions each source/drain region into N contact regions and calculates a set of resistances of elements and connections to the FET device. The measured dimensions of widths, lengths, and distances of layout shapes forming the FET and the connections to the FET are determined and a set of weights based on relative widths of the contact regions are computed. The total source/drain resistance of the FET device is determined by summing products of the set of resistances and the set of weights for each of a plurality of contacts in series, the summing being performed for all of the plurality of contacts in one of a source region and a drain region of the FET. A netlist is formed based on the total source resistance and total drain resistance of the FET device.
申请公布号 US8479131(B2) 申请公布日期 2013.07.02
申请号 US201113038468 申请日期 2011.03.02
申请人 DEWEY, III LEWIS W.;LU NING;MCCULLEN JUDITH H.;ZEMKE COLE E.;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 DEWEY, III LEWIS W.;LU NING;MCCULLEN JUDITH H.;ZEMKE COLE E.
分类号 G06F17/50 主分类号 G06F17/50
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