发明名称 |
Photosensitive resin composition |
摘要 |
There is provided a photosensitive resin composition comprising: (a) 100 parts by weight of a polyorganosiloxane obtained by a method of combining at least one silanol compound represented by the following formula (1): R12Si(OH)2(1) {the groups in the formula being defined in the claims}, at least one alkoxysilane compound represented by the following formula (2): R2aR3bSi(OR4)4-a-b(2) {the groups in the formula being defined in the claims} and a catalyst, and polymerizing them without active addition of water; (b) 1-50 parts by weight of a photopolymerization initiator; (c) 40-600 parts by weight of a fluorene compound represented by the following formula (3): {the groups in the formula being defined in the claims}; and (d) 20-300 parts by weight of a compound other than component (c), having one or two (meth)acryloyl groups in the molecule.
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申请公布号 |
US8475996(B2) |
申请公布日期 |
2013.07.02 |
申请号 |
US20080678974 |
申请日期 |
2008.12.11 |
申请人 |
AOAI NATSUMI;KOBAYASHI TAKAAKI;ASAHI KASEI E-MATERIALS CORPORATION |
发明人 |
AOAI NATSUMI;KOBAYASHI TAKAAKI |
分类号 |
G03F7/00;C08G77/04;G03F7/004;G03F7/027;G03F7/028 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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