发明名称 Image-compensating addressable electrostatic chuck system
摘要 Systems and methods are provided for utilizing an image-compensating addressable electrostatic chuck to correct for imaging errors of a lithographic system. An image-compensating addressable electrostatic chuck comprises a substrate, a plurality of first electrodes, a plurality of second electrodes, and a support layer. The plurality of first electrodes are disposed on the substrate and spaced evenly in a first direction. The plurality of second electrodes are disposed on the substrate and spaced evenly in a second direction, the second direction being generally orthogonal to the first direction. The support layer is disposed above the pluralities of electrodes to support an object. Positionally overlapping portions of the plurality of first and second electrodes form a matrix of electrostatic force points, such that a non-uniform electrostatic force acts on the object in proximity of a given force point upon energizing a pair of the plurality of first and second electrodes associated with the given force point.
申请公布号 US8477472(B2) 申请公布日期 2013.07.02
申请号 US201013321751 申请日期 2010.06.15
申请人 HANSEN MATTHEW E.;ASML HOLDING N.V. 发明人 HANSEN MATTHEW E.
分类号 H01G7/02 主分类号 H01G7/02
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