发明名称 |
Device manufacturing method, lithographic apparatus and a computer program |
摘要 |
The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.
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申请公布号 |
US8477287(B2) |
申请公布日期 |
2013.07.02 |
申请号 |
US20080531230 |
申请日期 |
2008.03.14 |
申请人 |
OUDSHOORN ALEX;LEVASIER LEON MARTIN;LOOPSTRA ERIK ROELOF;BLOK ROLAND;ASML NETHERLANDS B.V. |
发明人 |
OUDSHOORN ALEX;LEVASIER LEON MARTIN;LOOPSTRA ERIK ROELOF;BLOK ROLAND |
分类号 |
G03B27/42;G03B27/52;G03B27/58 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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