发明名称 APPARATUS TO CLEAN SUBSTRATE
摘要 PURPOSE: A substrate washing device is provided to reliably collect washing solutions by type by individually driving a plurality of collection cups collecting the washing solutions. CONSTITUTION: A washing chamber (110) includes a spin chuck (120) where a substrate (W) is loaded and rotated. A collection part (130) is formed to surround the spin chuck in the washing chamber. The collection part includes a plurality of collection cups (131,133,135) collecting sprayed washing solutions by type. The plurality of collection cups are laminated in the height direction. An exhaust part (150) forms a discharge path according to the position of the collection cups.
申请公布号 KR20130071737(A) 申请公布日期 2013.07.01
申请号 KR20110139121 申请日期 2011.12.21
申请人 K.C.TECH CO., LTD. 发明人 MOON, JAE GWON;KANG, BYOUNG JU
分类号 H01L21/302 主分类号 H01L21/302
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