| 摘要 |
PURPOSE: A deposition apparatus is provided to maintain a connection part in high temperature by reducing the temperature difference between a valve and the connection part, thereby preventing the generation of colloidal residues. CONSTITUTION: A deposition chamber (100) provides a space for processing a wafer (50). The deposition chamber includes a chamber (10), a heating element (60), a susceptor (37,38), and a wafer holder (40). A gas supplying part (200,300,400) is connected to the deposition chamber and supplies gas. A connection part (430) is connected to the gas supplying part. A valve (450) is connected to the connection part and controls the amount of the gas.
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