| 摘要 |
PURPOSE: A gas spray device and a substrate processing apparatus are provided to uniformly spray a gas on a substrate and to minimize a pumping influence around the gas spray device. CONSTITUTION: A shower head (300) includes a spray surface and a spray hole. The spray hole is formed on the spray surface and sprays a gas. The spray surface includes a source gas spray area (310a), a purge gas spray area (310c), and a reaction gas spray area (310b). A fluid path groove (301) is formed in a boundary between two adjacent gas spray areas. The fluid path groove prevents the gas from the adjacent gas spray area from being mixed. [Reference numerals] (301) Fluid path groove; (310a) Source gas spray area; (310b) Purge gas spray area; (310c) Reaction gas spray area
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