| 摘要 |
An apparatus for treating a substrate is provided to control easily the distance of washing brushes at the upper and lower portions of the washing brushes. A carrying member carries a substrate supplied into a treatment cistern(1) with a predetermined inclination angle. A brush unit washes the surface of the carried substrate. The brush unit includes a washing brush(31). The washing brush includes a mounting shaft rotatably installed into the treatment cistern along the shaft line up and down. The first arm is fixed to the upper and lower ends of the mounting shaft. The second arm is fixed to the other end of the mounting shaft. An end of the mounting shaft is rotatably supported to the first arm and the other end thereof is rotatably supported to the second arm. A driving mechanism is connected to the second arm, rocks the second arm and interlinks the first arm through the mounting so that the contact pressure is controlled. |
