发明名称 |
ULTRA THIN ALIGNMENT WALLS FOR DI-BLOCK COPOLYMER |
摘要 |
<p>Methods comprising providing a pre-patterned substrate having an array of thick walls, depositing a conforming layer on the pre-patterned substrate, etching the conforming layer from the top of the thick walls and the space between the walls, and etching the thick walls while leaving thin walls of conforming layerFigure 1</p> |
申请公布号 |
SG190634(A1) |
申请公布日期 |
2013.06.28 |
申请号 |
SG20130034806 |
申请日期 |
2009.11.13 |
申请人 |
SEAGATE TECHNOLOGY LLC |
发明人 |
LEE, KIM YANG;KUO, DAVID S.;BUECHEL, DOROTHEA;PELHOS, KALMAN |
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