发明名称 TERMINATION AND CONTACT STRUCTURES FOR A HIGH VOLTAGE GAN-BASED HETEROJUNCTION TRANSISTOR
摘要 A semiconductor device is provided that includes a substrate, a first active layer disposed over the substrate, and a second active layer disposed on the first active layer. The second active layer has a higher bandgap than the first active layer such that a two-dimensional electron gas layer arises between the first active layer and the second active layer. The second active layer includes first and second recesses formed therein. Source and drain contacts are disposed in the first and second recesses respectively. A gate electrode is disposed over the second active layer.
申请公布号 HK1142995(A1) 申请公布日期 2013.06.28
申请号 HK20100109341 申请日期 2010.09.29
申请人 VELOX SEMICONDUCTOR CORPORATION 发明人 MURPHY, MICHAEL;POPHRISTIC, MILAN
分类号 H01L 主分类号 H01L
代理机构 代理人
主权项
地址