| 摘要 |
<p>FERROMAGNETIC MATERIAL SPUTTERING TARGETProvided is a ferromagnetic material sputtering target comprising a‘-) metal having a composition that Cr is contained in an amount of 20 mol% or less, Ru is contained in an amount of 0.5 mol% or more and 30 mol% or less, and the remainder is Co, wherein the target has a structure including a base metal (A) and, within the base metal (A), a Co-Ru alloy phase (B) containing 35 molc/0 or more of Ru. The present invention provides a ferromagnetic io material sputtering target that can improve leakage magnetic flux to allow stable discharge with a magnetron sputtering apparatus.</p> |
