| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method in which a space between fine periodic patterns and a comparatively large-sized pattern disposed at the end thereof is narrowed down to approximately a space inside the fine periodic patterns. <P>SOLUTION: In a pattern forming method, an inversion layer 34 is formed on a core material film 31 having a pattern of a mask film 32 in which periodic patterns 32a and a non-periodic pattern 32b are mixed, and the inversion layer 34 is removed until a top surface of the mask film 32 is exposed. By using periodic patterns 34a and a non-periodic pattern 34b obtained by selectively removing the mask film 32 as masks, the core material film 31 is etched, thus a reverse pattern having periodic patterns and a non-periodic pattern is formed. A side wall film is formed around the reverse pattern, and the periodic patterns are removed, thereby a side wall pattern is formed. A workpiece 14 is processed by using the side wall pattern and the non-periodic pattern surrounded by the side wall film as masks. <P>COPYRIGHT: (C)2013,JPO&INPIT |
