发明名称 |
VERTICALLY ETCHED FACETS FOR DISPLAY DEVICES |
摘要 |
<p>This disclosure provides systems, methods and apparatus for masked reflective structures which can be integrated into display devices. In one aspect, masks and etch leading layers can be used to control the etching of a stack of layers to form masked reflective structures having a desired profile. In particular, tapered edges at a particular angle can be formed, and the resulting structures used in a roll-to-roll process to fabricate a device component.</p> |
申请公布号 |
WO2013096130(A1) |
申请公布日期 |
2013.06.27 |
申请号 |
WO2012US69875 |
申请日期 |
2012.12.14 |
申请人 |
QUALCOMM MEMS TECHNOLOGIES, INC. |
发明人 |
TUNG, MING-HAU;GANAPATHI, SRINIVASAN KODAGANALLUR |
分类号 |
G02B26/00;G06F3/044 |
主分类号 |
G02B26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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