发明名称 Support, Lithographic Apparatus and Device Manufacturing Method
摘要 A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.
申请公布号 US2013164688(A1) 申请公布日期 2013.06.27
申请号 US201213686186 申请日期 2012.11.27
申请人 ASML NETHERLANDS B.V.;ASML NETHERLANDS B.V. 发明人 CADEE THEODORUS PETRUS MARIA;ZAAL KOEN JACOBUS JOHANNES MARIA;SINGH HARMEET
分类号 G03B27/58;G03F7/20;H01L21/683 主分类号 G03B27/58
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