发明名称 |
Support, Lithographic Apparatus and Device Manufacturing Method |
摘要 |
A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.
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申请公布号 |
US2013164688(A1) |
申请公布日期 |
2013.06.27 |
申请号 |
US201213686186 |
申请日期 |
2012.11.27 |
申请人 |
ASML NETHERLANDS B.V.;ASML NETHERLANDS B.V. |
发明人 |
CADEE THEODORUS PETRUS MARIA;ZAAL KOEN JACOBUS JOHANNES MARIA;SINGH HARMEET |
分类号 |
G03B27/58;G03F7/20;H01L21/683 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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