| 摘要 |
<p>Disclosed is a processing apparatus comprising an exposure apparatus. The exposure apparatus comprises: an alignment device including an X-axis alignment device and a Y-axis alignment device, the X-axis alignment device approaching a substrate in an X-axis direction from either side of a substrate so as to align, in the X-axis direction, the substrate which has been loaded onto a flat fixing plate of a shuttle device having fingers on which multiple substrates are disposed, respectively, and a driving device for loading the multiple substrates onto the flat fixing plates to be exposed, respectively, the Y-axis alignment device approaching a substrate in a Y-axis direction from either sides of the substrate so as to align the substrate in the Y-axis direction; and an exposure unit arranged vertically relative to the substrate aligned by the alignment device so as to perform an exposure process.</p> |
