| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a water treatment apparatus which can control occurrence of deposit in piping. <P>SOLUTION: The water treatment apparatus for controlling occurrence of deposit in first piping in which raw water flows includes: a first flow meter 7 for measuring the raw water flow rate in the first piping; second piping L2a for returning the raw water bifurcated and taken from the first piping to the first piping again; a first pump 1a for flowing the raw water in the second piping; a second flow meter 2a for measuring the raw water flow rate in the second piping; a pH vale of the second piping to be input; a pH adjuster storage tank 4a; a second pump 5a adding a pH adjuster from the pH adjuster storage tank 4a to the second piping; and a control part 6a for controlling the flow rate of the second pump based on the measurement value of the pH meter 3a or 3b, such that the pH value of the raw water after adding the pH adjuster becomes a target pH value. <P>COPYRIGHT: (C)2013,JPO&INPIT |
