发明名称 |
SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provided a semiconductor device manufacturing method which causes less contamination of a semiconductor chip and which has good manufacturing efficiency. <P>SOLUTION: A manufacturing method of a semiconductor chip having a semiconductor chip, comprises: step A of preparing semiconductor chips; step B of preparing a resin sheet having a thermoset resin layer; step C of arranging a plurality of semiconductor chips on the thermoset resin layer; and step D of arranging cover films on the plurality of semiconductor chips and burying the plurality of semiconductor chips in the thermoset resin layer by pressure applied via the arranged cover films. A contact angle of the cover film to water is lower than or equal to 90°. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013128060(A) |
申请公布日期 |
2013.06.27 |
申请号 |
JP20110277335 |
申请日期 |
2011.12.19 |
申请人 |
NITTO DENKO CORP |
发明人 |
SHIMIZU YUSAKU;AKIZUKI SHINYA;ODA TAKASHI;TOYODA HIDESHI;MATSUMURA TAKESHI |
分类号 |
H01L21/56;H01L23/12;H01L23/29;H01L23/31 |
主分类号 |
H01L21/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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