发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provided a semiconductor device manufacturing method which causes less contamination of a semiconductor chip and which has good manufacturing efficiency. <P>SOLUTION: A manufacturing method of a semiconductor chip having a semiconductor chip, comprises: step A of preparing semiconductor chips; step B of preparing a resin sheet having a thermoset resin layer; step C of arranging a plurality of semiconductor chips on the thermoset resin layer; and step D of arranging cover films on the plurality of semiconductor chips and burying the plurality of semiconductor chips in the thermoset resin layer by pressure applied via the arranged cover films. A contact angle of the cover film to water is lower than or equal to 90&deg;. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013128060(A) 申请公布日期 2013.06.27
申请号 JP20110277335 申请日期 2011.12.19
申请人 NITTO DENKO CORP 发明人 SHIMIZU YUSAKU;AKIZUKI SHINYA;ODA TAKASHI;TOYODA HIDESHI;MATSUMURA TAKESHI
分类号 H01L21/56;H01L23/12;H01L23/29;H01L23/31 主分类号 H01L21/56
代理机构 代理人
主权项
地址