发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF
摘要 The invention relates to a positive photosensitive resin composition with good temporal stability. The invention also provides a method for manufacturing a thin-film transistor array substrate, a thin-film transistor array substrate and a liquid crystal display device.
申请公布号 US2013164461(A1) 申请公布日期 2013.06.27
申请号 US201213710798 申请日期 2012.12.11
申请人 CHI MEI CORPORATION;CHI MEI CORPORATION 发明人 CHEN KAI-MIN;SHIH CHUN-AN
分类号 G03F7/039;G02F1/1333 主分类号 G03F7/039
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