发明名称 |
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF |
摘要 |
The invention relates to a positive photosensitive resin composition with good temporal stability. The invention also provides a method for manufacturing a thin-film transistor array substrate, a thin-film transistor array substrate and a liquid crystal display device.
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申请公布号 |
US2013164461(A1) |
申请公布日期 |
2013.06.27 |
申请号 |
US201213710798 |
申请日期 |
2012.12.11 |
申请人 |
CHI MEI CORPORATION;CHI MEI CORPORATION |
发明人 |
CHEN KAI-MIN;SHIH CHUN-AN |
分类号 |
G03F7/039;G02F1/1333 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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