发明名称 |
POLYCRYSTALLINE SILICON INGOT, PROCESS FOR PRODUCING SAME, AND USES THEREOF |
摘要 |
<p>A process for producing a polycrystalline silicon ingot by unidirectionally solidifying molten silicon in a crucible upward from the bottom of the crucible, wherein the molten silicon is unidirectionally solidified under such conditions that when the temperature measured at a position in the vicinity of the center of the undersurface of the crucible falls from (Tm-20)°C to (Tm-60)°C, where Tm is the temperature measured at the position when the silicon temperature is the melting point of the silicon, then there is a period during which that temperature falls at a rate of 1-10 °C/hr, thereby obtaining the polycrystalline silicon ingot.</p> |
申请公布号 |
WO2013094245(A1) |
申请公布日期 |
2013.06.27 |
申请号 |
WO2012JP70001 |
申请日期 |
2012.08.06 |
申请人 |
SHARP KABUSHIKI KAISHA;OISHI, RYUICHI;UENO, KAZUYA;KAJIMOTO, KIMIHIKO |
发明人 |
OISHI, RYUICHI;UENO, KAZUYA;KAJIMOTO, KIMIHIKO |
分类号 |
C01B33/02;C30B29/06;H01L31/04 |
主分类号 |
C01B33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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